Octopus II
O
ctopus II is a tailor made and modular equipment for pilot production purposes. This product line keeps all benefits from Octopus I PECVD cluster and further offers increased substrate size and additional process technologies to ultimately provide our customers the possibility to manufacture and optimize entire solar cells inside one single system without exposing cells to air and moistures between fabrication steps.
The possibility to produce entire solar cells inside one
single system without exposing cells to air and moistures
during fabrication
Octopus II product line features
Versatility
Versatile equipment that allows researchers to build their desired tool based a modular and complete set of options including:
- PECVD (Plasma Enhanced Chemical Vapor Deposition) chamber
- PVD (Physical Vapor Deposition) chamber
- Pre-treatment chamber
- Post-treatment & hydrogenation chamber
- In-situ characterization chamber
- Customized chamber
Flexibility
Flexible equipment allowing users to master their process:
- Domain of applications
- Process & system parameters
- Integration of customized modules
Reliability & Reproducibility
- Automated equipment with digital control of all major components
- Process reproducibility
- High throughput allowing the production of several batches in order to obtain
significant test samples and accelerate the transfer of technology
Applications
- Advanced c-Si:
- PECVD: intrinsic and doped amorphous silicon, a-Si:H, other Si alloys such as SiNx, SiOx for passivation
- PVD: TCO and metals (front and back contacts)
- Thin film silicon:
- PECVD: intrinsic and doped Si layers, a-Si:H, a-SiGe:H, μc-Si:H, other Si alloys such as SiNx, SiOx for passivation
- PVD: TCO and metals (front and back contacts)
Substrates
- Glass substrate: 300 mm x 400 mm
- Si wafer substrate: 12" diameter
