Octopus I & II
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ctopus is a fully automated PECVD cluster equipment allowing our customers to reach wide range of process regimes for the deposition of Si based thin films. Entire system is mounted with turbo molecular and backing pumps to achieve high vacuum conditions.
The common tool is a cluster equipment with 8 ports around the central unit for accommodation of up to eight modules (loading/unloading station, depositions, characterization). The transfer chamber is equipped with a vacuum multi-axis robot to pick & place solar cells from one module to another.
IRFE technology comes included into each of our PECVD reactors of our Octopus products. Our product range is summarized below:
* Octopus I, II MM and II R&D: shared gas box, process pumps and power generator for all process modules.
** Octopus II PP: independent gas box, process pump and power generator for each process module.
Do not hesitate to contact us to learn more about IRFE and our Octopus products.
Octopus II
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he Octopus II line for large area deposition is the newest addition to the Octopus Family. This product line keeps all benefits from Octopus I PECVD cluster and further offers increased substrate size and additional process technologies to ultimately provide our customers the possibility to manufacture and optimize entire solar cells inside one single system without exposing cells to air and moistures between fabrication steps.
The possibility to produce entire solar cells inside one
single system without exposing cells to air and moistures
during fabrication
In order to best suit our clients’ needs, we have made Octopus II available in 3 different formats:
Manual Mode | R&D | Pilot Production
Octopus II PP - Pilot Production
Octopus II PP is a tailor made and modular equipment suitable for pilot production operations. All benefits from Octopus II R&D Large Area Deposition are kept.
- Glass substrate: slightly bigger than 300 x 400 mm
- Si wafer batches: 4 x 6” or 6 x 5”
- This is a fully automated cluster equipment.
- Permits up 6 process modules and 2 load locks to be attached to the transfer chamber.
- Its main advantage over Octopus II Manual Mode and R&D versions is that in Octopus II PP, each process module has it own independent gas box, process pump and power generator, allowing parallel processing and therefore, high throughput.
- The transfer chamber is equipped with a manually operated vacuum multi-axis robot to pick and place substrates between the 2 modules.
- Octopus II PP is fully and easily upgradable option to Octopus II R&D; therefore, our customers can start with the R&D version and pass to pilot production by adding required components.
Octopus II - R & D
Octopus II is a tailor made and modular equipment for mid-size to large R&D labs as well as for pilot production use.
- This is a fully automated cluster equipment.
- Permits up to 7 process modules and 1 load lock to be attached to the transfer chamber.
- The transfer chamber is equipped with a vacuum multi-axis robot to pick and place substrates from one module to another.
- Components such as the gas box, RF generator and process pump are shared between all chambers.
Octopus II - Manual Mode
Octopus II manual mode is our basic option for Large Area Deposition for Lab Use.
- It comes with 2 process modules, which clients can decide to have either PECVD or PVD modules according to their lab needs.
- Process modules are attached to a square transfer chamber.
- The transfer chamber comes standard with an integrated load lock.
- The transfer chamber is equipped with a manually operated vacuum multi-axis robot to pick and place substrates between the 2 modules.
- Components such as the gas box, RF generator and process pump are shared by the 2 chambers.
Octopus I
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ctopus I is a fully automated PECVD cluster equipment allowing our customers to reach wide range of process regimes for the deposition of Si based thin films. Entire system is mounted with turbo molecular and backing pumps to achieve high vacuum conditions.
Octopus product line features
Versatility
Versatile equipment that allows researchers to build their desired tool based a modular and complete set of options including:
- PECVD (Plasma Enhanced Chemical Vapor Deposition) chamber
- PVD (Physical Vapor Deposition) chamber
- Pre-treatment chamber
- Post-treatment & hydrogenation chamber
- In-situ characterization chamber
- Customized chamber
Flexibility
Flexible equipment allowing users to master their process:
- Domain of applications
- Process & system parameters
- Integration of customized modules
Reliability & Reproducibility
- Automated equipment with digital control of all major components
- Process reproducibility
- High throughput allowing the production of several batches in order to obtain
significant test samples and accelerate the transfer of technology
